CUNY ASRC NanoFabrication Facility Equipment
Xenon Difluoride Etcher (SPTS XACTIX E1)
Xenon Difluoride can be used to isotropically etch Si, Ge, and Mo films. The XeF2 etch chemistry offers excellent selectivity to a wide range of materials, such as Al, SiO2, ZnO, Si3N4, and photoresist affording the possibility of using thin masks and incorporating etch-stop layers for undercutting.
Access Instructions
Contact the CUNY Advanced Science Research Center NanoFabrication Facility at nanofab@asrc.cuny.edu with inquiries. Potential new users can visit http://nanofab.asrc.cuny.edu/become-a-member/ for instructions on becoming a qualified user.
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a member of CUNY ASRC NanoFabrication Facility, a member of a group partnered with this group, or
affiliated with the resource owner.
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