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Spts xactix e1 xenon difluoride etcher

CUNY ASRC NanoFabrication Facility Equipment

Xenon Difluoride Etcher (SPTS XACTIX E1)

http://nanofab.asrc.cuny.edu/tool/spts-xactix-e1-xenon-difluoride-etcher/

Xenon Difluoride can be used to isotropically etch Si, Ge, and Mo films. The XeF2 etch chemistry offers excellent selectivity to a wide range of materials, such as Al, SiO2, ZnO, Si3N4, and photoresist affording the possibility of using thin masks and incorporating etch-stop layers for undercutting.


Access Instructions

Contact the CUNY Advanced Science Research Center NanoFabrication Facility at nanofab@asrc.cuny.edu with inquiries. Potential new users can visit http://nanofab.asrc.cuny.edu/become-a-member/ for instructions on becoming a qualified user.


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To gain access you must be a member of CUNY ASRC NanoFabrication Facility, a member of a group partnered with this group, or affiliated with the resource owner.


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